http://www.japantimes.co.jp/news/20...technology-promotes-hair-growth/#.WBH1zvk2vIV
Sharp claims new ion technology ‘promotes’ hair growth
JIJI
OSAKA – Sharp Corp. says that its Plasmacluster ion technology, designed to disinfect and deodorize air, is also effective in promoting hair growth — a claim that comes as the electronics firm looks to market new beauty products using the technology.
The company said Thursday external studies it commissioned have confirmed that the Plasmacluster ion technology helps enhance the ability of scalp skin to maintain moisture, creating a better environment for hair growth.
In an experiment, 115 people, ranging in age from their 20s to 70s, shaved a 2 centimeter round spot on the right and left sides of their heads.
The shaved spot on the right side of each head was exposed to Plasmacluster ions for some 20 minutes each day while the other side was left untreated.
The number of hairs that grew in the shaved spots on the right side was found to be 2.5 times the number on the left side, according to Sharp.
In another experiment involving 59 women between the ages of 40 and 63, unshaven scalps on about half the subjects were exposed to the ions for 5 minutes a day for 12 weeks. The amount of oil on their scalps decreased more than the amount for the remaining women, whose scalps were not exposed to Plasmacluster ions, Sharp said.
The ion technology also reduced by 64 percent the bacteria that causes dandruff and scalp itching, the firm added.
Sharp claims new ion technology ‘promotes’ hair growth
JIJI
OSAKA – Sharp Corp. says that its Plasmacluster ion technology, designed to disinfect and deodorize air, is also effective in promoting hair growth — a claim that comes as the electronics firm looks to market new beauty products using the technology.
The company said Thursday external studies it commissioned have confirmed that the Plasmacluster ion technology helps enhance the ability of scalp skin to maintain moisture, creating a better environment for hair growth.
In an experiment, 115 people, ranging in age from their 20s to 70s, shaved a 2 centimeter round spot on the right and left sides of their heads.
The shaved spot on the right side of each head was exposed to Plasmacluster ions for some 20 minutes each day while the other side was left untreated.
The number of hairs that grew in the shaved spots on the right side was found to be 2.5 times the number on the left side, according to Sharp.
In another experiment involving 59 women between the ages of 40 and 63, unshaven scalps on about half the subjects were exposed to the ions for 5 minutes a day for 12 weeks. The amount of oil on their scalps decreased more than the amount for the remaining women, whose scalps were not exposed to Plasmacluster ions, Sharp said.
The ion technology also reduced by 64 percent the bacteria that causes dandruff and scalp itching, the firm added.
